JPH0627952Y2 - ウエハトレイ・サセプタ・トレイ受台の形状 - Google Patents
ウエハトレイ・サセプタ・トレイ受台の形状Info
- Publication number
- JPH0627952Y2 JPH0627952Y2 JP7007089U JP7007089U JPH0627952Y2 JP H0627952 Y2 JPH0627952 Y2 JP H0627952Y2 JP 7007089 U JP7007089 U JP 7007089U JP 7007089 U JP7007089 U JP 7007089U JP H0627952 Y2 JPH0627952 Y2 JP H0627952Y2
- Authority
- JP
- Japan
- Prior art keywords
- tray
- wafer
- susceptor
- wafer tray
- peripheral surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 title claims description 28
- 230000002093 peripheral effect Effects 0.000 claims description 61
- 238000001947 vapour-phase growth Methods 0.000 description 6
- 239000010409 thin film Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000013022 venting Methods 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7007089U JPH0627952Y2 (ja) | 1989-06-15 | 1989-06-15 | ウエハトレイ・サセプタ・トレイ受台の形状 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7007089U JPH0627952Y2 (ja) | 1989-06-15 | 1989-06-15 | ウエハトレイ・サセプタ・トレイ受台の形状 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0310528U JPH0310528U (en]) | 1991-01-31 |
| JPH0627952Y2 true JPH0627952Y2 (ja) | 1994-07-27 |
Family
ID=31605926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7007089U Expired - Fee Related JPH0627952Y2 (ja) | 1989-06-15 | 1989-06-15 | ウエハトレイ・サセプタ・トレイ受台の形状 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0627952Y2 (en]) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2804664B2 (ja) * | 1992-01-21 | 1998-09-30 | 株式会社日立製作所 | 試料の静電吸着機構及び電子線描画装置 |
| EP1811559A4 (en) | 2004-10-19 | 2010-04-21 | Canon Anelva Corp | SUBSTRATE HOLDING - / - TRANSFER CHARGER |
| JP4758385B2 (ja) * | 2007-04-06 | 2011-08-24 | シャープ株式会社 | 気相成長装置及び気相成長方法 |
| CN111926305B (zh) * | 2020-08-12 | 2024-10-11 | 厦门乾照半导体科技有限公司 | 一种用于led晶圆制程的载盘 |
-
1989
- 1989-06-15 JP JP7007089U patent/JPH0627952Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0310528U (en]) | 1991-01-31 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |